R2POWER300

Preparing R2 extension to 300mm for BCD Smart Power and Power Discrete

Dissemination

Journal papers

1) C. Cozzi, G. Polito, K. Kolasinski, G. Barillaro, Controlled Microfabrication of High-Aspect-Ratio Structures in Silicon at the Highest Etching Rates: The Role of H2O2 in the Anodic Dissolution of Silicon in Acidic Electrolytes, Advanced Functional Materials,  27, 1604310 (2017)

2) S. Vangelista,  Rossella Piagge, Satu Ek, Tiina Sarnet, Gabriella Ghidini and Alessio Lamperti, Structural, Chemical and Optical Properties of Cerium Dioxide Film Prepared by Atomic Layer Deposition on TiN and Si Substrates, Thin Solid Films, DOI: 10.1016/j.tsf.2017.05.034  [View preprint pdf]

3) G. Polito, C. Cozzi, G. Barillaro Controlling the Electrochemical Etching of Pores with High Aspect Ratio at the Submicrometer Scale in Silicon, ECS Transactions, Vol. 77, No. 5, pp. 259-266, 2017.[View preprint pdf]

4) C. Cozzi, G. Polito, K. W. Kolasinski, G. Barillaro Controlled Fabrication of High Aspect Ratio Microstructures in Silicon at Etching Rates Beyond State of the Art Microstructuring Technologies, ECS Transactions, Vol. 77, No. 5, pp. 199-206, 2017. [View preprint pdf]

Conference presentations

1) Tommi Suni and Satu Ek ALD for MEMS, MEMSWAVE, 4-6th July, 2016,  Romania.

2) Riina Ritasalo, Kestutis Grigoras, Satu Ek, Tero Lehto, Erik Østreng, Tero Pilvi, Alexey Veselov, High aspect ratio structures deposited by ALD for 3D applications, 16th International Conference on Atomic Layer Deposition, 24th-27th July 2016, Dublin, Ireland, www.ald2016.com

3) Riina Ritasalo, Kestutis Grigoras, Satu Ek, Tero Lehto, Erik Østreng, Tero Pilvi, Alexey Veselov, High aspect ratio structures deposited by ALD for 3D applications. Baltic Conference on Atomic Layer Deposition (BALD) , 2-4th Oct., 2016, St. Petersburg Russia, http://www.bald2016.ru/

4) M. Scurati, R2POWER300 European Nanoelectronic Forum – Rome 23, 24 November 2016

5) S. Ek, R. Ritasalo, T. Sarnet, J. Kalliomäki, E. Østreng, S. Vangelista, A. Lamperti, R. Piagge, G.Ghidini, High-k RE oxide ALD films characterized by SEM and electrical techniques, 17th International Conference on Atomic Layer Deposition, 15th-18th July 2017, Denver, Colorado, US, https://aldconference.avs.org/

6) S. Ek, R. Ritasalo, T. Sarnet, J. Kalliomäki, E. Østreng, S. Vangelista, A. Lamperti, R. Piagge, G.Ghidini High-k RE oxide ALD films characterized by SEM and electrical techniques, Joint EUROCVD-21-Baltic ALD-15, 11th-14th June 2017, Linköping, Sweden, http://www.eurocvd-balticald2017.se/

6) S. Vangelista,  Rossella Piagge, Satu Ek, Tiina Sarnet, Gabriella Ghidini and Alessio Lamperti, Structural Properties of Cerium Dioxide Film Prepared by Atomic Layer Deposition on TiN and Si Substrates - 2017 MRS Spring Meeting, April 17-21, 2017 in Phoenix, Arizona - Symposium: ED7: Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory, and Power. [View pdf]

7) M. Scurati, R2POWER300, Ecsel JU Symposium, 13, 14 June 2017, Porto Maso, St. Julian's, Malta. [View pdf]

8)  A.N. Tallarico, , S. Reggiani , P. Magnone , G. Croce , R. Depetro , P. Gattari, E. Sangiorgi, C. Fiegna, Investigation of the hot carrier degradation in power LDMOS transistors with customized thick oxide accepted for èresentation, ESREF 2017 [View abstract pdf]

11) Controlled Fabrication of High-Aspect-Ratio Microstructures in Silicon at Etching Rates Beyond State-of-the-Art Microstructuring Technologies C. Cozzi, G. Polito (University of Pisa), K. W. Kolasinski (West Chester University), and G. Barillaro (University of Pisa 231st ECS Meeting, New Orleans (USA), May 28 - June 1st, 2017 [View abstract pdf]
 
10) Controlling the Electrochemical Etching of Pores with High Aspect Ratio at the Submicrometer Scale in Silicon G. Polito, C. Cozzi, and G. Barillaro (University of Pisa) 231st ECS Meeting, New Orleans (USA), May 28 - June 1st, 2017 [View abstract pdf]
 

 Exhibitions

Semicon Show, Grenoble, 26 October 2016 (Besi-NL) [View pdf]

SMT Hybrid Packaging 2017, Nuremberg, 18 May 2017 (Besi-NL)

Dissemination through Master and PhD Courses

Electronic Technologies for Energy and Information Technology, Master Course "Electronics and Telecommunications Enegineering for Energy", University of Bologna (IUNET)

Marco Morelli, STMicroelectronics - Italy, “Semiconductor trip: from a simple idea to a complex manufacturing”, 
PhD in Information Engineering, Information Engineering Dpt, University of Pisa, 19-23 june 2017 (total teaching hours: 27)